Doped Hydrogenated Amorphous Silicon Films by Laser-Induced Chemical Vapor Deposition

Research output: Contribution to journal › Article

Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

NREL Publication Number

@article{f525d4cb62da486492d7823abaa8c8f2,

title = "Doped Hydrogenated Amorphous Silicon Films by Laser-Induced Chemical Vapor Deposition",

author = "NREL",

note = "Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts",

year = "1986",

doi = "10.1063/1.96933",

language = "American English",

volume = "48",

pages = "171--173",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "2",

}

TY - JOUR

T1 - Doped Hydrogenated Amorphous Silicon Films by Laser-Induced Chemical Vapor Deposition

AU - NREL, null

N1 - Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

PY - 1986

Y1 - 1986

U2 - 10.1063/1.96933

DO - 10.1063/1.96933

M3 - Article

SN - 0003-6951

VL - 48

SP - 171

EP - 173

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

ER -