Abstract
A double-hole-mediated coupling of dopants is unraveled and confirmed in TiO2 by density-functional theory calculations. We find that when a dopant complex on neighboring oxygen sites in TiO2 has net two holes, the holes will strongly couple to each other through significant lattice relaxation. The coupling results in the formation of fully filled impurity bands lying above the valence band of TiO2, leading to a much more effective band gap reduction than that induced by monodoping or conventional donor-acceptor codoping. Our results suggest a new path for semiconductor band gap engineering.
Original language | American English |
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Article number | Article No. 066801 |
Number of pages | 4 |
Journal | Physical Review Letters |
Volume | 106 |
Issue number | 6 |
DOIs | |
State | Published - 10 Feb 2011 |
NREL Publication Number
- NREL/JA-5200-49654
Keywords
- band gap engineering
- double-hole-mediated coupling
- semiconductors
- TiO2