Effect of Deposition Temperature on the Photoresponse of Crystallized Hydrogenated Amorphous Silicon Films

Effect of Deposition Temperature on the Photoresponse of Crystallized Hydrogenated Amorphous Silicon Films

NREL

Research output: Contribution to conference › Paper

Original language	American English
Pages	921-926
Number of pages	6
State	Published - 1995
Event	Microcrystalline and Nanocrystalline Semiconductors: Materials Research Society Symposium - Boston, Massachusetts Duration: 29 Nov 1994 → 2 Dec 1994

Conference

Conference	Microcrystalline and Nanocrystalline Semiconductors: Materials Research Society Symposium
City	Boston, Massachusetts
Period	29/11/94 → 2/12/94

Bibliographical note

Work performed by State University of New York, Buffalo, New York and Plasma Physics Corporation, Locust Valley, New York

NLR Publication Number

ACNR/CP-16580

Cite this

@conference{a7a19936ff9140e38d8801a204244ec0,

title = "Effect of Deposition Temperature on the Photoresponse of Crystallized Hydrogenated Amorphous Silicon Films",

author = "NREL",

note = "Work performed by State University of New York, Buffalo, New York and Plasma Physics Corporation, Locust Valley, New York; Microcrystalline and Nanocrystalline Semiconductors: Materials Research Society Symposium ; Conference date: 29-11-1994 Through 02-12-1994",

year = "1995",

language = "American English",

pages = "921--926",

}

TY - CONF

T1 - Effect of Deposition Temperature on the Photoresponse of Crystallized Hydrogenated Amorphous Silicon Films

AU - NREL, null

N1 - Work performed by State University of New York, Buffalo, New York and Plasma Physics Corporation, Locust Valley, New York

PY - 1995

Y1 - 1995

M3 - Paper

SP - 921

EP - 926

T2 - Microcrystalline and Nanocrystalline Semiconductors: Materials Research Society Symposium

Y2 - 29 November 1994 through 2 December 1994

ER -