Effect of H2 Dilution on Thin Film SiN Deposited by Hot Wire CVD Using SiH4 and NH3 Gas Mixtures

Research output: Contribution to conference › Paper

Original language	American English
Pages	A7.2.1 - A7.2.6
State	Published - 2001
Event	Amorphous and Heterogeneous Silicon-Based Films 2001: Materials Research Society Symposium - San Francisco, California Duration: 16 Apr 2001 → 20 Apr 2001

Conference	Amorphous and Heterogeneous Silicon-Based Films 2001: Materials Research Society Symposium
City	San Francisco, California
Period	16/04/01 → 20/04/01

NREL Publication Number

@conference{bc457861139447c49160bef8c9f305f1,

title = "Effect of H2 Dilution on Thin Film SiN Deposited by Hot Wire CVD Using SiH4 and NH3 Gas Mixtures",

author = "NREL",

year = "2001",

language = "American English",

pages = "A7.2.1 -- A7.2.6",

note = "Amorphous and Heterogeneous Silicon-Based Films 2001: Materials Research Society Symposium ; Conference date: 16-04-2001 Through 20-04-2001",

}