Effect of High-Resistance SnO2 on CdS/CdTe Device Performance

    Research output: Contribution to conferencePaper

    Abstract

    In this paper, we have studied the effect of high-resistance SnO2 buffer layers, deposited by low-pressure chemical-vapor deposition, on CdS/CdTe device performance. Our results indicate that when CdS/CdTe devices have a very thin layer of CdS or no CdS at all, the i-SnO2 buffer layer helps to increase device efficiency. When the CdS layer is thicker than 600..Alpha.., the device performance isdominated by CdS thickness, not the i-SnO2 layer. If a very thin CdS layer is to be used to enhance device performance, we conclude that a better SnO2 buffer layer is needed.
    Original languageAmerican English
    Number of pages8
    StatePublished - 1998
    EventNational Center for Photovoltaics Program Review Meeting - Denver, Colorado
    Duration: 8 Sep 199811 Sep 1998

    Conference

    ConferenceNational Center for Photovoltaics Program Review Meeting
    CityDenver, Colorado
    Period8/09/9811/09/98

    NREL Publication Number

    • NREL/CP-520-25607

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