Effect of Increasing Growth Rates on Film Properties and Device Performance for DC Glow Discharge Amorphous Silicon

Effect of Increasing Growth Rates on Film Properties and Device Performance for DC Glow Discharge Amorphous Silicon

Research output: Contribution to conference › Paper

Original language	American English
Pages	553-558
Number of pages	6
State	Published - 2002
Event	Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium - San Francisco, California Duration: 2 Apr 2002 → 5 Apr 2002

Conference

Conference	Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium
City	San Francisco, California
Period	2/04/02 → 5/04/02

Bibliographical note

Work performed by University of Oregon, Eugene, Oregon; BP Solar, Toano, Virginia

NREL Publication Number

NREL/CP-520-34506

Cite this

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title = "Effect of Increasing Growth Rates on Film Properties and Device Performance for DC Glow Discharge Amorphous Silicon",

author = "NREL",

note = "Work performed by University of Oregon, Eugene, Oregon; BP Solar, Toano, Virginia; Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium ; Conference date: 02-04-2002 Through 05-04-2002",

year = "2002",

language = "American English",

pages = "553--558",

}

TY - CONF

T1 - Effect of Increasing Growth Rates on Film Properties and Device Performance for DC Glow Discharge Amorphous Silicon

AU - NREL, null

N1 - Work performed by University of Oregon, Eugene, Oregon; BP Solar, Toano, Virginia

PY - 2002

Y1 - 2002

M3 - Paper

SP - 553

EP - 558

T2 - Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium

Y2 - 2 April 2002 through 5 April 2002

ER -