Effect of Low Level Doping of Boron and Phosphorous on the Properties of Amorphous Silicon Films

Effect of Low Level Doping of Boron and Phosphorous on the Properties of Amorphous Silicon Films

NREL

Research output: Contribution to conference › Paper

Original language	American English
Pages	137-144
Number of pages	8
State	Published - 1987
Event	MRS Spring Meeting - Anaheim, California Duration: 21 Apr 1987 → 24 Apr 1987

Conference

Conference	MRS Spring Meeting
City	Anaheim, California
Period	21/04/87 → 24/04/87

Bibliographical note

Work performed by Electronic and Information Sector Laboratories, 3M Company, St. Paul, Minnesota

NLR Publication Number

ACNR/CP-10027

Cite this

@conference{0783dae32e7f41c798a9d44f52800e44,

title = "Effect of Low Level Doping of Boron and Phosphorous on the Properties of Amorphous Silicon Films",

author = "NREL",

note = "Work performed by Electronic and Information Sector Laboratories, 3M Company, St. Paul, Minnesota; MRS Spring Meeting ; Conference date: 21-04-1987 Through 24-04-1987",

year = "1987",

language = "American English",

pages = "137--144",

}