Abstract
This conference paper describes the molybdenum thin films that were deposited on soda lime glass (SLG) substrates using direct-current planar magnetron sputtering, with a sputtering power density of 1.2 W/cm2. The working gas (Ar) pressure was varied from 0.6 to 16 mtorr to induce changes in the Mo films' morphology and microstructure. Thin films of Cu(In,Ga)Se2 (CIGS) were deposited on theMo-coated glass using the 3-stage co-evaporation process. The morphology of both the Mo-coated SLG and the CIGS thin films grown on it was examined using high-resolution scanning electron microscopy. Na was depth profiled in the Mo and CIGS films by secondary ion mass spectrometry. The device performance was evaluated under standard conditions of 1000 W/m2 and 25oC. Optimum device performance isfound for an intermediate Mo sputtering pressure.
Original language | American English |
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Number of pages | 7 |
State | Published - 2002 |
Event | 29th IEEE PV Specialists Conference - New Orleans, Louisiana Duration: 20 May 2002 → 24 May 2002 |
Conference
Conference | 29th IEEE PV Specialists Conference |
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City | New Orleans, Louisiana |
Period | 20/05/02 → 24/05/02 |
Bibliographical note
Prepared for the 29th IEEE PV Specialists Conference, 20-24 May; 2002, New Orleans, LouisianaNREL Publication Number
- NREL/CP-520-32254
Keywords
- antireflective coatings
- direct-current planar magnetron sputtering
- molybdenum thin films
- PV
- scanning electron microscopy (SEM)
- secondary ion mass spectrometry (SIMS)
- soda lime glass (SLG)