Effective Interfaces in Silicon Heterojunction Solar Cells

T. H. Wang, E. Iwaniczko, M. R. Page, D. H. Levi, Y. Yan, V. Yelundur, H. M. Branz, A. Rohatgi, Q. Wang

Research output: Contribution to conferencePaperpeer-review

43 Scopus Citations


Thin hydrogenated amorphous silicon (a-Si:H) layers deposited by hot-wire chemical vapor deposition (HWCVD) are investigated for use in silicon heterojunction (SHJ) solar cells on p-type crystalline silicon wafers. A requirement for excellent emitter quality is minimization of interface recombination. Best results necessitate immediate a-Si:H deposition and an abrupt and flat interface to the c-Si substrate. We obtain a record planar HJ efficiency of 16.9% with a high Voc of 652 mV on p-type float-zone (FZ) silicon substrates with HWCVD a-Si:H(n) emitters and screen-printed AI-BSF contacts. H pretreatment by HWCVD is beneficial when limited to a very short period prior to emitter deposition.

Original languageAmerican English
Number of pages4
StatePublished - 2005
Event31st IEEE Photovoltaic Specialists Conference - 2005 - Lake Buena Vista, FL, United States
Duration: 3 Jan 20057 Jan 2005


Conference31st IEEE Photovoltaic Specialists Conference - 2005
Country/TerritoryUnited States
CityLake Buena Vista, FL

Bibliographical note

For preprint version see NREL/CP-520-37457

NREL Publication Number

  • NREL/CP-520-38896


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