Effects of Dilution Ratio and Seed Layer on the Crystallinity of Microcrystalline Silicon Thin Films Deposited by Hot-Wire Chemical Vapor Deposition

H. R. Moutinho, C. S. Jiang, J. Perkins, Y. Xu, B. P. Nelson, K. M. Jones, M. J. Romero, M. M. Al-Jassim

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