Effects of Gas Dilution on the Growth and Properties of Glow Discharge a-Ge:H

Effects of Gas Dilution on the Growth and Properties of Glow Discharge a-Ge:H

Research output: Contribution to conference › Paper

Original language	American English
Pages	547-552
Number of pages	6
State	Published - 1992
Event	Amorphous Silicon Technology - 1992: Materials Research Society Symposium - San Francisco, California Duration: 27 Apr 1992 → 1 May 1992

Conference

Conference	Amorphous Silicon Technology - 1992: Materials Research Society Symposium
City	San Francisco, California
Period	27/04/92 → 1/05/92

Bibliographical note

Work performed by Boston College Department of Physics, Chestnut Hill, Massachusetts and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts

NREL Publication Number

ACNR/CP-14604

Cite this

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title = "Effects of Gas Dilution on the Growth and Properties of Glow Discharge a-Ge:H",

author = "NREL",

note = "Work performed by Boston College Department of Physics, Chestnut Hill, Massachusetts and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts; Amorphous Silicon Technology - 1992: Materials Research Society Symposium ; Conference date: 27-04-1992 Through 01-05-1992",

year = "1992",

language = "American English",

pages = "547--552",

}

TY - CONF

T1 - Effects of Gas Dilution on the Growth and Properties of Glow Discharge a-Ge:H

AU - NREL, null

N1 - Work performed by Boston College Department of Physics, Chestnut Hill, Massachusetts and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts

PY - 1992

Y1 - 1992

M3 - Paper

SP - 547

EP - 552

T2 - Amorphous Silicon Technology - 1992: Materials Research Society Symposium

Y2 - 27 April 1992 through 1 May 1992

ER -