Abstract
In-situ UV illumination influences the incorporation dynamics of bismuth adatom in GaAs. Here we use the inherent variation of the fluence across the sample to explore the role of the incident irradiation. With illumination it is found that steady state growth processes are achieved more quickly resulting in more abrupt interfaces, as well as uniform GaAs1-xGaAs1-xBixBix epi-layers. Comparisons of low temperature photoluminescence spectra show an increasing density of clusters of incorporated bismuth atoms with decreasing incident fluence.
Original language | American English |
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Pages (from-to) | 7-11 |
Number of pages | 5 |
Journal | Journal of Crystal Growth |
Volume | 484 |
DOIs | |
State | Published - 2018 |
NREL Publication Number
- NREL/JA-5K00-70754
Keywords
- bismuth compounds
- impurities
- molecular beam epitaxy
- semiconducting III-V materials