Effects of In-situ UV Irradiation on the Uniformity and Optical Properties of GaAsBi Epi-layers Grown by MBE

Daniel Beaton, Mark Steger, Theresa Christian, Angelo Mascarenhas

Research output: Contribution to journalArticlepeer-review

1 Scopus Citations

Abstract

In-situ UV illumination influences the incorporation dynamics of bismuth adatom in GaAs. Here we use the inherent variation of the fluence across the sample to explore the role of the incident irradiation. With illumination it is found that steady state growth processes are achieved more quickly resulting in more abrupt interfaces, as well as uniform GaAs1-xGaAs1-xBixBix epi-layers. Comparisons of low temperature photoluminescence spectra show an increasing density of clusters of incorporated bismuth atoms with decreasing incident fluence.
Original languageAmerican English
Pages (from-to)7-11
Number of pages5
JournalJournal of Crystal Growth
Volume484
DOIs
StatePublished - 2018

NREL Publication Number

  • NREL/JA-5K00-70754

Keywords

  • bismuth compounds
  • impurities
  • molecular beam epitaxy
  • semiconducting III-V materials

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