Abstract
ZnSnN2 has recently garnered increasing interest as a potential solar absorber material due to its direct bandgap that is predicted to be tunable from 1.0-2.1 eV based on cation disorder. One important challenge to the further development of this material for photovoltaics (PV) is to reliably synthesize films with carrier density ≤1017 electrons cm-3. In this work, we perform a systematic annealing study on compositionally-graded Zn-Sn-N thin films to determine the effects on carrier density and transport of such post-growth treatment. We find that annealing up to 6 hr under an activated nitrogen atmosphere results in a reduction in carrier density by ∼80% for zinc-rich films, and by ∼50% for stoichiometric films. However, we also find that annealing reduces mobility as a function of increasing annealing time. This result suggests that initial film disorder hampers the benefits to film quality that should have been gained through annealing. This finding highlights that carefully managed initial growth conditions will be necessary to obtain PV-quality ZnSnN2 absorber films.
Original language | American English |
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Number of pages | 5 |
DOIs | |
State | Published - 14 Dec 2015 |
Externally published | Yes |
Event | 42nd IEEE Photovoltaic Specialist Conference, PVSC 2015 - New Orleans, United States Duration: 14 Jun 2015 → 19 Jun 2015 |
Conference
Conference | 42nd IEEE Photovoltaic Specialist Conference, PVSC 2015 |
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Country/Territory | United States |
City | New Orleans |
Period | 14/06/15 → 19/06/15 |
Bibliographical note
Publisher Copyright:© 2015 IEEE.
NREL Publication Number
- NREL/CP-5J00-65797
Keywords
- Annealing
- microsctructure
- nitrogen
- sputtering
- thin films