Efficient Black Silicon Solar Cells with Nanoporous Anti-Reflection Made in a Single-Step Liquid Etch

Hao Chih Yuan, Vernon E. Yost, Matthew R. Page, Lorenzo Roybal, Bobby To, Paul Stradins, Daniel L. Meier, Howard M. Branz

Research output: Contribution to conferencePaperpeer-review

13 Scopus Citations

Abstract

We fabricated black silicon solar cells with conversion efficiency of 16.8% on p-type single crystal Si wafers with a conventional diffused emitter and Al back-surface field (BSF). We replaced the anti-reflection coating step with a single 3-minute 'black-silicon' etch of the bare wafer before processing. The nanoporous black-silicon layer, about 300-nm thick is produced in a 3-minute single-step liquid etch based upon catalysis by Au nano-particles formed in a solution containing HF and H2O2. Solar cell reflectance is well below 5% at incident wavelengths from 350 to 1000 nm. We present reflectance versus time data during this simple single-step etching. We also characterize cell performance and find that recombination in the black silicon surface layer must still be reduced.

Original languageAmerican English
Pages141-145
Number of pages5
DOIs
StatePublished - 2009
Event2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009 - Philadelphia, PA, United States
Duration: 7 Jun 200912 Jun 2009

Conference

Conference2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009
Country/TerritoryUnited States
CityPhiladelphia, PA
Period7/06/0912/06/09

NREL Publication Number

  • NREL/CP-520-46036

Keywords

  • coatings
  • etching
  • gold
  • hafnium
  • laboratories
  • nanoporous materials
  • photovoltaic cells
  • reflectivity
  • renewable energy resources
  • silicon

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