Electrical and Optical Properties of Ion Beam Sputtered ZnO:Al Films as a Function of Film Thickness

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	PP. 996-1000
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	11
Issue number	4
DOIs	https://doi.org/10.1116/1.578582
State	Published - 1993

NREL Publication Number

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title = "Electrical and Optical Properties of Ion Beam Sputtered ZnO:Al Films as a Function of Film Thickness",

author = "NREL",

year = "1993",

doi = "10.1116/1.578582",

language = "American English",

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journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

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T1 - Electrical and Optical Properties of Ion Beam Sputtered ZnO:Al Films as a Function of Film Thickness

AU - NREL, null

PY - 1993

Y1 - 1993

U2 - 10.1116/1.578582

DO - 10.1116/1.578582

M3 - Article

SN - 0734-2101

VL - 11

SP - PP. 996-1000

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

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