Electronic and Optical Properties of Amorphous Si:H Films Deposited by Chemical Vapor Deposition

Research output: Contribution to journal › Article

Work performed by Chronar Corporation, Princeton, New Jersey

NREL Publication Number

@article{c71f68bc4c774d439f4c0b85f9e0dc0d,

title = "Electronic and Optical Properties of Amorphous Si:H Films Deposited by Chemical Vapor Deposition",

author = "NREL",

note = "Work performed by Chronar Corporation, Princeton, New Jersey",

year = "1982",

doi = "10.1063/1.93414",

language = "American English",

volume = "41",

pages = "1146--1148",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "12",

}

TY - JOUR

T1 - Electronic and Optical Properties of Amorphous Si:H Films Deposited by Chemical Vapor Deposition

AU - NREL, null

N1 - Work performed by Chronar Corporation, Princeton, New Jersey

PY - 1982

Y1 - 1982

U2 - 10.1063/1.93414

DO - 10.1063/1.93414

M3 - Article

SN - 0003-6951

VL - 41

SP - 1146

EP - 1148

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 12

ER -