Electronic and Optical Properties of Amorphous Si:H Films Deposited by Chemical Vapor Deposition

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)1146-1148
    Number of pages3
    JournalApplied Physics Letters
    Issue number12
    StatePublished - 1982

    Bibliographical note

    Work performed by Chronar Corporation, Princeton, New Jersey

    NREL Publication Number

    • ACNR/JA-3930

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