Abstract
We report on the crystallinity and photoelectrochemical (PEC) response of ZnO thin films codoped by Ga and N. The ZnO:(Ga,N) thin films were deposited by cosputtering at room temperature and followed by postannealing at 500 °C in air for 2 h. We found that ZnO:(Ga,N) thin films exhibited significantly enhanced crystallinity compared to ZnO doped solely with N at the same growth conditions. Furthermore, ZnO:(Ga,N) thin films exhibited enhanced N incorporation over ZnO doped solely with N at high temperatures. As a result, ZnO:(Ga,N) thin films achieved dramatically improved PEC response, compared to ZnO thin films doped solely with N at any conditions. Our results suggest a general way to improve PEC response for wide-band-gap oxides.
Original language | American English |
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Article number | Article No. 231909 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 91 |
Issue number | 23 |
DOIs | |
State | Published - 2007 |
NREL Publication Number
- NREL/JA-520-42349
Keywords
- co-doping
- co-sputtering
- crystallinity
- photoelectrochemical
- ZnO