Epitaxial Growth of CZTS on Si Substrates Investigated with Electron Backscatter Diffraction

Research output: Contribution to conferencePaperpeer-review

5 Scopus Citations

Abstract

The objective of this work is to develop procedures for growing high-quality epitaxial Cu2ZnSnS4 thin films. We deposited our films by molecular beam epitaxy, with different growth parameters, on [100]- and [111]-oriented Si substrates. To study the growth of the films, we used electron backscatter diffraction. We found that, under the right conditions, we were able to grow epitaxial [111]-oriented CZTS films that had a common characteristic: the existence of two domains, both with the same orientation, but rotated by 60° between each other. In this paper, we investigate the reliability of the EBSD analysis to study different domains in CZTS films, and correlate the film growth with deposition parameters, attempting to gain insight on the characteristics of the boundaries between the two domains.

Original languageAmerican English
Pages2379-2383
Number of pages5
DOIs
StatePublished - 15 Oct 2014
Event40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States
Duration: 8 Jun 201413 Jun 2014

Conference

Conference40th IEEE Photovoltaic Specialist Conference, PVSC 2014
Country/TerritoryUnited States
CityDenver
Period8/06/1413/06/14

Bibliographical note

Publisher Copyright:
© 2014 IEEE.

NREL Publication Number

  • NREL/CP-5K00-61239

Keywords

  • CZTS
  • EBSD
  • epitaxial growth

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