Epitaxial Silicon Thin Films by Low Temperature Aluminum Induced Crystallization of Amorphous Silicon: Paper No. 0910-A21-04

Mowafak Al-Jassim

Epitaxial Silicon Thin Films by Low Temperature Aluminum Induced Crystallization of Amorphous Silicon: Paper No. 0910-A21-04

Materials, Chemical, and Computational Science

Research output: Contribution to conference › Paper

Original language	American English
Pages	517-522
Number of pages	6
State	Published - 2006
Event	Amorphous and Polycrystalline Thin-Film Silicon Science and Technology: Materials Research Society Symposium - San Francisco, California Duration: 18 Apr 2006 → 21 Apr 2006

Conference

Conference	Amorphous and Polycrystalline Thin-Film Silicon Science and Technology: Materials Research Society Symposium
City	San Francisco, California
Period	18/04/06 → 21/04/06

NREL Publication Number

NREL/CP-520-41683

Cite this

@conference{689c8f5218114e2794a98ab63e9397f4,

title = "Epitaxial Silicon Thin Films by Low Temperature Aluminum Induced Crystallization of Amorphous Silicon: Paper No. 0910-A21-04",

author = "Mowafak Al-Jassim",

year = "2006",

language = "American English",

pages = "517--522",

note = "Amorphous and Polycrystalline Thin-Film Silicon Science and Technology: Materials Research Society Symposium ; Conference date: 18-04-2006 Through 21-04-2006",

}

Epitaxial Silicon Thin Films by Low Temperature Aluminum Induced Crystallization of Amorphous Silicon: Paper No. 0910-A21-04. / Al-Jassim, Mowafak.
2006. 517-522 Paper presented at Amorphous and Polycrystalline Thin-Film Silicon Science and Technology: Materials Research Society Symposium, San Francisco, California.

Research output: Contribution to conference › Paper