Abstract
A critical technical evaluation of the ITO/GaAs solar cell is presented, emphasizing the factors limiting the performance of the device. The devices are fabricated on p-type (Be-doped) GaAs grown by MBE, with the ITO deposited by ion beam techniques. Light and dark J-V characteristics are presented and compared for these devices. The formation of buried homojunctions is postulated for cells damaged due to ion beam deposition, leading to higher V//o//c and low J//s//c. Heterojunction formation is observed for minimally disrupted GaAs surfaces. AES depth profiles are used to evaluate the chemicalwidth of the ITO/GaAs interfaces. Electrical data characterizing the ITO/GaAs interface are obtained using EBIC, C-V and intensity dependent V//o//c-J//s//c characteristics.
Original language | American English |
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Pages (from-to) | 410-413 |
Number of pages | 4 |
Journal | Journal of vacuum science & technology |
Volume | 20 |
Issue number | 3 |
DOIs | |
State | Published - 1981 |
Externally published | Yes |
Event | Proc of the Natl Symp of the Am Vac Soc, Pt 1 - Anaheim, Calif, USA Duration: 2 Nov 1981 → 6 Nov 1981 |
NREL Publication Number
- ACNR/JA-213-3735