Abstract
The impact of interface switching sequences on interface quality and minority carrier recombination in In0.53 Ga0.47 AsInP double heterostructure (DH) grown by solid-source molecular-beam epitaxy (MBE) was studied. As2 exposure at the lower In0.53 Ga0.47 AsInP interface prior to In0.53 Ga0.47 As growth was found to cause enhanced As diffusion into the underlying InP that correlates with steadily increased photoconductive decay (PCD) lifetimes beyond the theoretical radiative and Auger limit. Low-temperature PCD measurements reveal that a persistent photoconductivity (PPC) process is responsible for the high "apparent" lifetimes. The PPC effect increases monotonically with As2 exposure on the InP surface, implying the involvement of interfacial defects in the carrier recombination dynamics of In0.53 Ga0.47 AsInP DHs grown by MBE.
Original language | American English |
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Article number | 032106 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 3 |
DOIs | |
State | Published - 18 Jul 2005 |
NREL Publication Number
- NREL/JA-520-38818