Abstract
We present data showing the potential adverse effects on photovoltaic device performance of all traps in InGaAsN. Deep-level transient spectroscopy measurements were performed on InGaAsN samples grown by both metal-organic chemical vapor deposition and RF plasma-assisted molecular-beam epitaxy. For each growth technique, we studied samples with varying nitrogen composition ranging from 0% to 2.2%. A deep hole trap with activation energy ranging between 0.5 and 0.8 eV is observed in all samples. These data clearly obey the Meyer-Neldel rule, which states that all traps have the same emission rate at the isokinetic temperature. A fit of our trap data gives an isokinetic temperature of 350 K, which means that both deep and shallow traps emit slowly at the operating temperature of solarcells-thus, the traps can be recombination centers.
Original language | American English |
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Number of pages | 9 |
State | Published - 2003 |
Event | 2003 Materials Research Society Spring Meeting - San Francisco, California Duration: 21 Apr 2003 → 25 Apr 2003 |
Conference
Conference | 2003 Materials Research Society Spring Meeting |
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City | San Francisco, California |
Period | 21/04/03 → 25/04/03 |
NREL Publication Number
- NREL/CP-520-33229
Keywords
- deep level transient spectroscopy (DLTS)
- INGaAsN
- isokinetic temperature
- metal-organic chemical vapor deposition (MOCVD)
- Meyer-Neldel rule
- molecular beam epitaxy (MBE)
- PV
- RF plasma-assisted