Excellent Passivation and Low Reflectivity Al2O3/TiO2 Bilayer Coatings for n-Wafer Silicon Solar Cells: Preprint

Jarmo Skrap; Ville Malinen; Shuo Li

Excellent Passivation and Low Reflectivity Al2O3/TiO2 Bilayer Coatings for n-Wafer Silicon Solar Cells: Preprint

Jarmo Skrap
, Ville Malinen
, Shuo Li

Beneq

Research output: Contribution to conference › Paper

Abstract

A bilayer coating of Al2O3 and TiO2 is used to simultaneously achieve excellent passivation and low reflectivity on p-type silicon. This coating is targeted for achieving high efficiency n-wafer Si solar cells, where both passivation and anti-reflection (AR) are needed at the front-side p-type emitter. It could also be valuable for front-side passivation and AR of rear-emitter and interdigitatedback contact p-wafer cells. We achieve high minority carrier lifetimes1 ms, as well as a nearly 2% decrease in absolute reflectivity, as compared to a standard silicon nitride AR coating.

Original language	American English
Number of pages	5
State	Published - 2012
Event	2012 IEEE Photovoltaic Specialists Conference - Austin, Texas Duration: 3 Jun 2012 → 8 Jun 2012

Conference

Conference	2012 IEEE Photovoltaic Specialists Conference
City	Austin, Texas
Period	3/06/12 → 8/06/12

NLR Publication Number

NREL/CP-5200-54121

Keywords

anti-reflection
atomic layer deposition
minority-carrier lifetime
n-wafer silicon
passivation

Access to Document

https://www.nrel.gov/docs/fy12osti/54121.pdf

Cite this

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title = "Excellent Passivation and Low Reflectivity Al2O3/TiO2 Bilayer Coatings for n-Wafer Silicon Solar Cells: Preprint",

abstract = "A bilayer coating of Al2O3 and TiO2 is used to simultaneously achieve excellent passivation and low reflectivity on p-type silicon. This coating is targeted for achieving high efficiency n-wafer Si solar cells, where both passivation and anti-reflection (AR) are needed at the front-side p-type emitter. It could also be valuable for front-side passivation and AR of rear-emitter and interdigitatedback contact p-wafer cells. We achieve high minority carrier lifetimes1 ms, as well as a nearly 2\% decrease in absolute reflectivity, as compared to a standard silicon nitride AR coating.",

keywords = "anti-reflection, atomic layer deposition, minority-carrier lifetime, n-wafer silicon, passivation",

author = "Jarmo Skrap and Ville Malinen and Shuo Li",

year = "2012",

language = "American English",

note = "2012 IEEE Photovoltaic Specialists Conference ; Conference date: 03-06-2012 Through 08-06-2012",

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TY - CONF

T1 - Excellent Passivation and Low Reflectivity Al2O3/TiO2 Bilayer Coatings for n-Wafer Silicon Solar Cells: Preprint

AU - Skrap, Jarmo

AU - Malinen, Ville

AU - Li, Shuo

PY - 2012

Y1 - 2012

N2 - A bilayer coating of Al2O3 and TiO2 is used to simultaneously achieve excellent passivation and low reflectivity on p-type silicon. This coating is targeted for achieving high efficiency n-wafer Si solar cells, where both passivation and anti-reflection (AR) are needed at the front-side p-type emitter. It could also be valuable for front-side passivation and AR of rear-emitter and interdigitatedback contact p-wafer cells. We achieve high minority carrier lifetimes1 ms, as well as a nearly 2% decrease in absolute reflectivity, as compared to a standard silicon nitride AR coating.

AB - A bilayer coating of Al2O3 and TiO2 is used to simultaneously achieve excellent passivation and low reflectivity on p-type silicon. This coating is targeted for achieving high efficiency n-wafer Si solar cells, where both passivation and anti-reflection (AR) are needed at the front-side p-type emitter. It could also be valuable for front-side passivation and AR of rear-emitter and interdigitatedback contact p-wafer cells. We achieve high minority carrier lifetimes1 ms, as well as a nearly 2% decrease in absolute reflectivity, as compared to a standard silicon nitride AR coating.

KW - anti-reflection

KW - atomic layer deposition

KW - minority-carrier lifetime

KW - n-wafer silicon

KW - passivation

M3 - Paper

T2 - 2012 IEEE Photovoltaic Specialists Conference

Y2 - 3 June 2012 through 8 June 2012

ER -

Excellent Passivation and Low Reflectivity Al2O3/TiO2 Bilayer Coatings for n-Wafer Silicon Solar Cells: Preprint

Abstract

Conference

NLR Publication Number

Keywords

Access to Document

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Cite this