Explanation for the Low-Temperature H Evolution Peak in Hydrogenated Amorphous Silicon Films Deposited 'On the Edge of Crystallinity'

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
Pages (from-to)647-652
Number of pages6
JournalPhilosophical Magazine Letters
Volume80
Issue number9
DOIs
StatePublished - 2000

NREL Publication Number

  • NREL/JA-520-29522

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