Explanation for the Low-Temperature H Evolution Peak in Hydrogenated Amorphous Silicon Films Deposited 'On the Edge of Crystallinity'

    Research output: Contribution to journalArticlepeer-review

    Original languageAmerican English
    Pages (from-to)647-652
    Number of pages6
    JournalPhilosophical Magazine Letters
    Volume80
    Issue number9
    DOIs
    StatePublished - 2000

    NREL Publication Number

    • NREL/JA-520-29522

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