Femtosecond Far-Infrared Studies of Carrier Dynamics in Hydrogenated Amorphous Silicon and Silicon-Germanium Alloys

A. V.V. Nampoothiri, B. P. Nelson, S. L. Dexheimer

Research output: Contribution to conferencePaperpeer-review

6 Scopus Citations

Abstract

We present femtosecond time-resolved studies of the photoexcited carrier response in the far-infrared spectral range in PECVD a-Si:H and a-SiGe:H thin films. The experiments are carried out using an optical pump / terahertz (THz) probe technique, in which a femtosecond pump pulse excites carriers in the sample and a time-delayed probe pulse measures the resulting change in the far-infrared optical properties as a function of time delay following the excitation. These measurements are sensitive to carrier processes at low energy, corresponding to a range of approximately 1-10 meV, a key energy scale in these materials. We find that the observed photoexcited carrier dynamics are consistent with trapping of carriers into band tail states on a picosecond time scale.

Original languageAmerican English
Pages333-337
Number of pages5
DOIs
StatePublished - 2003
EventMaterials Research Proceedings: Amorphous and Nanocrystalline Silicon-Based Films - 2003 - San Francisco, CA, United States
Duration: 22 Apr 200325 Apr 2003

Conference

ConferenceMaterials Research Proceedings: Amorphous and Nanocrystalline Silicon-Based Films - 2003
Country/TerritoryUnited States
CitySan Francisco, CA
Period22/04/0325/04/03

NREL Publication Number

  • NREL/CP-520-36070

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