Abstract
We present femtosecond time-resolved studies of the photoexcited carrier response in the far-infrared spectral range in PECVD a-Si:H and a-SiGe:H thin films. The experiments are carried out using an optical pump / terahertz (THz) probe technique, in which a femtosecond pump pulse excites carriers in the sample and a time-delayed probe pulse measures the resulting change in the far-infrared optical properties as a function of time delay following the excitation. These measurements are sensitive to carrier processes at low energy, corresponding to a range of approximately 1-10 meV, a key energy scale in these materials. We find that the observed photoexcited carrier dynamics are consistent with trapping of carriers into band tail states on a picosecond time scale.
Original language | American English |
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Pages | 333-337 |
Number of pages | 5 |
DOIs | |
State | Published - 2003 |
Event | Materials Research Proceedings: Amorphous and Nanocrystalline Silicon-Based Films - 2003 - San Francisco, CA, United States Duration: 22 Apr 2003 → 25 Apr 2003 |
Conference
Conference | Materials Research Proceedings: Amorphous and Nanocrystalline Silicon-Based Films - 2003 |
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Country/Territory | United States |
City | San Francisco, CA |
Period | 22/04/03 → 25/04/03 |
NREL Publication Number
- NREL/CP-520-36070