Film Formation Mechanisms in the Plasma Deposition of Hydrogenated Amorphous Silicon

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)2998-3001
    Number of pages4
    JournalJournal of Applied Physics
    Issue number8
    StatePublished - 1986

    Bibliographical note

    Work performed by Xerox Palo Alto Research Center, Palo Alto, California

    NREL Publication Number

    • ACNR/JA-7403

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