Film Growth Mechanisms of Plasma-Deposited Amorphous Silicon Studied by Step Coverage

    Research output: Contribution to conferencePaper

    Original languageAmerican English
    Number of pages10
    StatePublished - 1987
    EventInternational Workshop on Amorphous Semiconductors - Beijing, China
    Duration: 13 Oct 198618 Oct 1986


    ConferenceInternational Workshop on Amorphous Semiconductors
    CityBeijing, China

    Bibliographical note

    Work performed by Xerox Palo Alto Research Center, Palo Alto, California

    NREL Publication Number

    • ACNR/CP-9457

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