Film Quality in Relation to Deposition Conditions of a-Si:H Films Deposited by the 'Hot Wire' Method Using Highly Diluted Silane

Research output: Contribution to journal › Article › peer-review

NREL Publication Number

@article{d3734b72354d4bccac46c73112726c37,

title = "Film Quality in Relation to Deposition Conditions of a-Si:H Films Deposited by the 'Hot Wire' Method Using Highly Diluted Silane",

author = "NREL",

year = "1996",

doi = "10.1063/1.361445",

language = "American English",

volume = "79",

pages = "7278--7292",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "9",

}