GaAs Solar Cell Grown by Dynamic Hydride Vapor Phase Epitaxy Using Nitrogen Carrier Gas

Elisabeth McClure, John Simon, Kevin Schulte, Wondwosen Metaferia, Aaron Ptak

Research output: Contribution to conferencePaperpeer-review

Abstract

We present a single-junction GaAs solar cell grown by dynamic hydride vapor phase epitaxy using nitrogen carrier gas at a growth rate of 30\ \mu\mathrm{m}/\mathrm{h}. The VOC of 1.05 V is comparable to the VOC of solar cells grown in our reactor with a hydrogen carrier, indicating that high material quality can be obtained with a nitrogen carrier.

Original languageAmerican English
Pages2456-2457
Number of pages2
DOIs
StatePublished - 14 Jun 2020
Event47th IEEE Photovoltaic Specialists Conference, PVSC 2020 - Calgary, Canada
Duration: 15 Jun 202021 Aug 2020

Conference

Conference47th IEEE Photovoltaic Specialists Conference, PVSC 2020
Country/TerritoryCanada
CityCalgary
Period15/06/2021/08/20

Bibliographical note

Publisher Copyright:
© 2020 IEEE.

NREL Publication Number

  • NREL/CP-5900-79364

Keywords

  • GaAs
  • HVPE
  • nitrogen carrier gas
  • photovoltaics

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