Gas Phase Diagnostics and Modelling of Tin Oxide Chemical Vapor Deposition: (Abstract No. 188)

Gas Phase Diagnostics and Modelling of Tin Oxide Chemical Vapor Deposition: (Abstract No. 188)

NREL

Research output: Contribution to conference › Paper

Original language	American English
Number of pages	297
State	Published - 1982
Event	162nd Meeting of the Electrochemical Society - Detroit, Michigan Duration: 17 Oct 1982 → 21 Oct 1982

Conference

Conference	162nd Meeting of the Electrochemical Society
City	Detroit, Michigan
Period	17/10/82 → 21/10/82

Bibliographical note

Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

NLR Publication Number

ACNR/CP-4055

Cite this

@conference{dea86347e3f44fa3a7fe9acde37cf73c,

title = "Gas Phase Diagnostics and Modelling of Tin Oxide Chemical Vapor Deposition: (Abstract No. 188)",

author = "NREL",

note = "Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts; 162nd Meeting of the Electrochemical Society ; Conference date: 17-10-1982 Through 21-10-1982",

year = "1982",

language = "American English",

}