Ge-Related Faceting and Segregation during the Growth of Metastable (GaAs)1-x(Ge2)x Alloy Layers by Metal--Organic Vapor-Phase Epitaxy

A. G. Norman, J. M. Olson, J. F. Geisz, H. R. Moutinho, A. Mason, M. M. Al-Jassim, S. M. Vernon

Research output: Contribution to journalArticlepeer-review

30 Scopus Citations

Abstract

(GaAs)1-x(Ge2)x alloy layers, 0<x<0.22, have been grown by metal-organic vapor-phase epitaxy on vicinal (001) GaAs substrates. Transmission electron microscopy revealed pronounced phase separation in these layers, resulting in regions of GaAs-rich zinc-blende and Ge-rich diamond cubic material that appears to lead to substantial band-gap narrowing. For x = 0.1 layers, the phase-separated microstructure consisted of intersecting sheets of Ge-rich material on {115}B planes surrounding cells of GaAs-rich material, with little evidence of antiphase boundaries. Atomic force microscopy revealed {115}B surface faceting associated with the phase separation.

Original languageAmerican English
Pages (from-to)1382-1384
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number10
DOIs
StatePublished - 1999

NREL Publication Number

  • NREL/JA-520-25806

Fingerprint

Dive into the research topics of 'Ge-Related Faceting and Segregation during the Growth of Metastable (GaAs)1-x(Ge2)x Alloy Layers by Metal--Organic Vapor-Phase Epitaxy'. Together they form a unique fingerprint.

Cite this