Grain Boundary and Dislocation Effects on the PV Performance of High-Purity Silicon

T. F. Ciszek, T. H. Wang, R. W. Burrows, X. Wu, J. Alleman, T. Bekkedahl, Y. S. Tsuo

Research output: Contribution to conferencePaperpeer-review

10 Scopus Citations

Abstract

To quantify the effects of grain size and dislocation defects on the minority charge carrier lifetime and photovoltaic (PV) efficiency of silicon, we grew high-purity, float-zoned (FZ) ingots with a range of grain sizes from single crystalline (dislocated and dislocation-free) down to 4 × 10-4 squared centimeters. In situ ingot cooling rates of 18 and 89 °C min-1 were used. Growth of FZ ingots with a range of grain sizes was accomplished by initiating growth from a fine-grained 22-mm-diameter seed cut along a diameter of a 1200-mm-diameter, chemical vapor deposited (CVD), polycrystalline Si log.

Original languageAmerican English
Pages101-105
Number of pages5
DOIs
StatePublished - 1993
EventProceedings of the 23rd IEEE Photovoltaic Specialists Conference - Louisville, KY, USA
Duration: 10 May 199314 May 1993

Conference

ConferenceProceedings of the 23rd IEEE Photovoltaic Specialists Conference
CityLouisville, KY, USA
Period10/05/9314/05/93

NREL Publication Number

  • NREL/CP-451-5550

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