Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation

B. L. Sopori; W. Chen; J. Alleman; R. Matson; N. M. Ravindra; T. Y. Tan

Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation

B. L. Sopori, W. Chen, J. Alleman, R. Matson, N. M. Ravindra, T. Y. Tan

Materials, Chemical, and Computational Science Research Operations

National Renewable Energy Laboratory

Research output: Contribution to conference › Paper › peer-review

1 Scopus Citations

Abstract

A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

Original language	American English
Pages	95-100
Number of pages	6
State	Published - 1998
Event	Proceedings of the 1997 MRS Fall Meeting - Boston, MA, USA Duration: 2 Dec 1997 → 5 Dec 1997

Conference

Conference	Proceedings of the 1997 MRS Fall Meeting
City	Boston, MA, USA
Period	2/12/97 → 5/12/97

NREL Publication Number

NREL/CP-520-23207

Cite this

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title = "Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation",

abstract = "A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.",

author = "Sopori, {B. L.} and W. Chen and J. Alleman and R. Matson and Ravindra, {N. M.} and Tan, {T. Y.}",

year = "1998",

language = "American English",

pages = "95--100",

note = "Proceedings of the 1997 MRS Fall Meeting ; Conference date: 02-12-1997 Through 05-12-1997",

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TY - CONF

T1 - Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation

AU - Sopori, B. L.

AU - Chen, W.

AU - Alleman, J.

AU - Matson, R.

AU - Ravindra, N. M.

AU - Tan, T. Y.

PY - 1998

Y1 - 1998

N2 - A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

AB - A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

UR - http://www.scopus.com/inward/record.url?scp=0031617474&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0031617474

SP - 95

EP - 100

T2 - Proceedings of the 1997 MRS Fall Meeting

Y2 - 2 December 1997 through 5 December 1997

ER -

Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation

Abstract

Conference

NREL Publication Number

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