Growth and Characterization of GaAs/Ge Epilayers Grown on Si Substrates by Molecular Beam Epitaxy

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)4186-4193
    Number of pages8
    JournalJournal of Applied Physics
    Volume58
    Issue number11
    DOIs
    StatePublished - 1985

    NREL Publication Number

    • ACNR/JA-213-7026

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