Abstract
Thin silicon filaments were grown from the melt by three different methods: (a) RF-heated float-zone pedestal growth of high-purity, dislocation-free, single-crystal filaments, (b) growth of <112> axis, (111) face, dendrite; filaments at high pulling rates from a supercooled melt in a quartz crucible, and (c) capillary die growth of thin-walled, small-diameter Si tube-filaments with high ratio ofsurface area to volume and concomitant device structure; advantages. Minority-carrier lifetime t was used to assess the filaments. For the three growth methods listed above, values as high as 660 msec, 53 msec, and 42 msec were observed, respectively. Thin silicon filaments with good crystallographic perfection, grown at high speeds, may be useful as active semiconductor elements in multiplelinear-concentrator-array PV systems and in other optoelectronic applications.
Original language | American English |
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Pages | 103-106 |
Number of pages | 4 |
State | Published - 1997 |
Event | Twenty Sixth IEEE Photovoltaic Specialists Conference - Anaheim, California Duration: 29 Sep 1997 → 3 Oct 1997 |
Conference
Conference | Twenty Sixth IEEE Photovoltaic Specialists Conference |
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City | Anaheim, California |
Period | 29/09/97 → 3/10/97 |
Bibliographical note
For preprint version, including full text online document, see NREL/CP-450-22927NREL Publication Number
- NREL/CP-590-25040