Growth and Properties of Silicon Filaments for Photovoltaic Applications

Research output: Contribution to conferencePaper

Abstract

Thin silicon filaments were grown from the melt by three different methods: (a) RF-heated float-zone pedestal growth of high-purity, dislocation-free, single-crystal filaments, (b) growth of <112> axis, (111) face, dendrite; filaments at high pulling rates from a supercooled melt in a quartz crucible, and (c) capillary die growth of thin-walled, small-diameter Si tube-filaments with high ratio ofsurface area to volume and concomitant device structure; advantages. Minority-carrier lifetime t was used to assess the filaments. For the three growth methods listed above, values as high as 660 msec, 53 msec, and 42 msec were observed, respectively. Thin silicon filaments with good crystallographic perfection, grown at high speeds, may be useful as active semiconductor elements in multiplelinear-concentrator-array PV systems and in other optoelectronic applications.
Original languageAmerican English
Pages103-106
Number of pages4
StatePublished - 1997
EventTwenty Sixth IEEE Photovoltaic Specialists Conference - Anaheim, California
Duration: 29 Sep 19973 Oct 1997

Conference

ConferenceTwenty Sixth IEEE Photovoltaic Specialists Conference
CityAnaheim, California
Period29/09/973/10/97

Bibliographical note

For preprint version, including full text online document, see NREL/CP-450-22927

NREL Publication Number

  • NREL/CP-590-25040

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