Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)

Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)

Research output: Contribution to conference › Paper

Original language	American English
Pages	37-42
Number of pages	6
State	Published - 1988
Event	MRS Spring Meeting - Reno, Nevada Duration: 5 Apr 1988 → 8 Apr 1988

Conference

Conference	MRS Spring Meeting
City	Reno, Nevada
Period	5/04/88 → 8/04/88

Bibliographical note

Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina

NREL Publication Number

ACNR/CP-10491

Cite this

@conference{0ef9337109bb41daa4de0fddf029ea94,

title = "Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)",

author = "NREL",

note = "Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina; MRS Spring Meeting ; Conference date: 05-04-1988 Through 08-04-1988",

year = "1988",

language = "American English",

pages = "37--42",

}