Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

M. F.A.M. Van Hest; A. J. Leenheer; J. D. Perkins; C. W. Teplin; D. S. Ginley

doi:10.1109/WCPEC.2006.279686

Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

M. F.A.M. Van Hest, A. J. Leenheer, J. D. Perkins, C. W. Teplin, D. S. Ginley

Materials, Chemical, and Computational Science

Research output: Contribution to conference › Paper › peer-review

2 Scopus Citations

Abstract

Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO₂ is chosen as a template candidate. RF sputtering of a CeO₂ target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO₂. However the texture orientation could not be modified using ISD.

Original language	American English
Pages	1368-1371
Number of pages	4
DOIs	https://doi.org/10.1109/WCPEC.2006.279686 https://doi.org/10.1109/WCPEC.2006.279686
State	Published - 2006
Event	2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 - Waikoloa, HI, United States Duration: 7 May 2006 → 12 May 2006

Conference

Conference	2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Country/Territory	United States
City	Waikoloa, HI
Period	7/05/06 → 12/05/06

NREL Publication Number

NREL/CP-520-39892

Access to Document

Cite this

Van Hest, M. F. A. M., Leenheer, A. J., Perkins, J. D., Teplin, C. W., & Ginley, D. S. (2006). Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering. 1368-1371. Paper presented at 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4, Waikoloa, HI, United States. https://doi.org/10.1109/WCPEC.2006.279686, https://doi.org/10.1109/WCPEC.2006.279686

@conference{87cf8e9bc64e42e58103d7665f8acb08,

title = "Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering",

abstract = "Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO2 is chosen as a template candidate. RF sputtering of a CeO2 target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO2. However the texture orientation could not be modified using ISD.",

author = "{Van Hest}, {M. F.A.M.} and Leenheer, {A. J.} and Perkins, {J. D.} and Teplin, {C. W.} and Ginley, {D. S.}",

year = "2006",

doi = "10.1109/WCPEC.2006.279686",

language = "American English",

pages = "1368--1371",

note = "2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 ; Conference date: 07-05-2006 Through 12-05-2006",

}

Van Hest, MFAM, Leenheer, AJ, Perkins, JD, Teplin, CW & Ginley, DS 2006, 'Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering', Paper presented at 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4, Waikoloa, HI, United States, 7/05/06 - 12/05/06 pp. 1368-1371. https://doi.org/10.1109/WCPEC.2006.279686, https://doi.org/10.1109/WCPEC.2006.279686

TY - CONF

T1 - Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

AU - Van Hest, M. F.A.M.

AU - Leenheer, A. J.

AU - Perkins, J. D.

AU - Teplin, C. W.

AU - Ginley, D. S.

PY - 2006

Y1 - 2006

N2 - Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO2 is chosen as a template candidate. RF sputtering of a CeO2 target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO2. However the texture orientation could not be modified using ISD.

AB - Recently, a new approach of using a biaxially textured template to grow crystalline silicon on glass for large-area electronics applications was proposed. Here CeO2 is chosen as a template candidate. RF sputtering of a CeO2 target in combination with ion beam assisted deposition (IBAD) has been used to create biaxially textured material on a glass substrate. The use of IBAD made it possible to change the texture orientation relative to that of film deposited without the use of IBAD. Another approach has also been studied where RF sputtering is used in combination with inclined substrate deposition (ISD). This approach also did result in the formation of biaxially textured CeO2. However the texture orientation could not be modified using ISD.

UR - http://www.scopus.com/inward/record.url?scp=41749085741&partnerID=8YFLogxK

U2 - 10.1109/WCPEC.2006.279686

DO - 10.1109/WCPEC.2006.279686

M3 - Paper

AN - SCOPUS:41749085741

SP - 1368

EP - 1371

T2 - 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

Y2 - 7 May 2006 through 12 May 2006

ER -

Growth of Biaxially Textured CeO2 Layers on Glass by Magnetron Sputtering

Abstract

Conference

NREL Publication Number

Access to Document

Other files and links

Fingerprint

Cite this