Abstract
We propose a physical model for diffusion of H in Si containing impurities and defects. The diffusion occurs via several parallel mechanisms, involving complex formation (trapping) and dissociation (detrapping) at impurities and defects, hopping in lattice interstitial sites, and charge-state conversion. The role of bulk and process-induced traps is considered to explain observations from plasma,ion implantation, and PECVD-nitridation processes.
Original language | American English |
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Number of pages | 8 |
State | Published - 2002 |
Event | 29th IEEE PV Specialists Conference - New Orleans, Louisiana Duration: 20 May 2002 → 24 May 2002 |
Conference
Conference | 29th IEEE PV Specialists Conference |
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City | New Orleans, Louisiana |
Period | 20/05/02 → 24/05/02 |
Bibliographical note
Prepared for the 29th IEEE PV Specialists Conference, 20-24 May; 2002, New Orleans, LouisianaNREL Publication Number
- NREL/CP-520-31396
Keywords
- defects
- H diffusion
- impurities
- nitridation
- optimum passivation
- PV
- solar cell processing
- traps