Abstract
Presented at the 2001 NCPV Program Review Meeting: Modeled diffusion of H in 2-step Si3N4 passivation process invoking concept of storage of H. H stored during nitridation is redistributed during subsequent anneal.
Original language | American English |
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Number of pages | 4 |
State | Published - 2001 |
Event | NCPV Program Review Meeting - Lakewood, Colorado Duration: 14 Oct 2001 → 17 Oct 2001 |
Conference
Conference | NCPV Program Review Meeting |
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City | Lakewood, Colorado |
Period | 14/10/01 → 17/10/01 |
NREL Publication Number
- NREL/CP-520-31002
Keywords
- H diffusion
- modeling
- nitridation
- passivation
- PV
- RTP
- Si3N4