H-Diffusion Mechanism(s) in PECVD Nitride Passivation of Si Solar Cells: Preprint

Research output: Contribution to conferencePaper

Abstract

Presented at the 2001 NCPV Program Review Meeting: Modeled diffusion of H in 2-step Si3N4 passivation process invoking concept of storage of H. H stored during nitridation is redistributed during subsequent anneal.
Original languageAmerican English
Number of pages4
StatePublished - 2001
EventNCPV Program Review Meeting - Lakewood, Colorado
Duration: 14 Oct 200117 Oct 2001

Conference

ConferenceNCPV Program Review Meeting
CityLakewood, Colorado
Period14/10/0117/10/01

NREL Publication Number

  • NREL/CP-520-31002

Keywords

  • H diffusion
  • modeling
  • nitridation
  • passivation
  • PV
  • RTP
  • Si3N4

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