H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers

H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers

Research output: Contribution to conference › Paper

Original language	American English
Pages	119-124
Number of pages	6
State	Published - 1999
Event	Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium - San Francisco, California Duration: 14 Apr 1998 → 17 Apr 1998

Conference

Conference	Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium
City	San Francisco, California
Period	14/04/98 → 17/04/98

NREL Publication Number

NREL/CP-520-24614

Cite this

@conference{a5cf367dc8b247b3bcf64534ba74614e,

title = "H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers",

author = "NREL",

year = "1999",

language = "American English",

pages = "119--124",

note = "Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium ; Conference date: 14-04-1998 Through 17-04-1998",

}

TY - CONF

T1 - H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers

AU - NREL, null

PY - 1999

Y1 - 1999

UR - http://www.scopus.com/inward/record.url?scp=0032675558&partnerID=8YFLogxK

M3 - Paper

SP - 119

EP - 124

T2 - Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium

Y2 - 14 April 1998 through 17 April 1998

ER -

H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers

Conference

NREL Publication Number

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Cite this