High Deposition Rate Interinsic Amorphous Silicon Materials and P-I-N Devices from Disilane

High Deposition Rate Interinsic Amorphous Silicon Materials and P-I-N Devices from Disilane

Research output: Contribution to conference › Paper

Original language	American English
Pages	153-162
Number of pages	10
State	Published - 1989
Event	1989 Amorphous Silicon Subcontractors' Review Meeting - Golden, Colorado Duration: 19 Jun 1989 → 20 Jun 1989

Conference

Conference	1989 Amorphous Silicon Subcontractors' Review Meeting
City	Golden, Colorado
Period	19/06/89 → 20/06/89

Bibliographical note

Work performed by Glasstech Solar, Inc., Wheat Ridge, Colorado

NREL Publication Number

ACNR/CP-11196

Cite this

@conference{8f4c7783cd9942ad91027deb1283448c,

title = "High Deposition Rate Interinsic Amorphous Silicon Materials and P-I-N Devices from Disilane",

author = "NREL",

note = "Work performed by Glasstech Solar, Inc., Wheat Ridge, Colorado; 1989 Amorphous Silicon Subcontractors' Review Meeting ; Conference date: 19-06-1989 Through 20-06-1989",

year = "1989",

language = "American English",

pages = "153--162",

}