High-Performance Metal Grids for Solar Cells Formed by Cracked Film Lithography

Christopher Muzzillo; Matthew Reese

High-Performance Metal Grids for Solar Cells Formed by Cracked Film Lithography

Christopher Muzzillo (Inventor), Matthew Reese (Inventor)

Materials Science

Research output: Patent

Abstract

Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.

Original language	American English
Patent number	12,132,129 B2
Filing date	29/10/24
State	Published - 2024

NREL Publication Number

NREL/PT-5K00-91840

Keywords

cracked film lithography
cracked film lithography grids
optoelectronic device

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https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/12132129

Cite this

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title = "High-Performance Metal Grids for Solar Cells Formed by Cracked Film Lithography",

abstract = "Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.",

keywords = "cracked film lithography, cracked film lithography grids, optoelectronic device",

author = "Christopher Muzzillo and Matthew Reese",

year = "2024",

language = "American English",

publisher = "National Renewable Energy Laboratory (NREL)",

address = "United States",

type = "Patent",

note = "12,132,129 B2",

}

TY - PAT

T1 - High-Performance Metal Grids for Solar Cells Formed by Cracked Film Lithography

AU - Muzzillo, Christopher

AU - Reese, Matthew

PY - 2024

Y1 - 2024

N2 - Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.

AB - Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.

KW - cracked film lithography

KW - cracked film lithography grids

KW - optoelectronic device

M3 - Patent

M1 - 12,132,129 B2

Y2 - 2024/10/29

PB - National Renewable Energy Laboratory (NREL)

ER -

High-Performance Metal Grids for Solar Cells Formed by Cracked Film Lithography

Abstract

NREL Publication Number

Keywords

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Cite this