Abstract
Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to prepare vanadium oxide thin films as cathodes for rechargeable lithium batteries. The reactants consisted of a high vapor pressure liquid source of vanadium (VOCl3) and hydrogen and oxygen gas. Deposition parameters such as the flow rates of H2, O2 and VOCl3, the substrate temperature and the Rf power were optimized, and highdeposition rate was obtained. Vanadium oxide films with high discharge capacities of up to 408 mAh/g were prepared. The films also showed a superior cycling stability between 4 and 1.5 V at a C/0.2 rate for more than 4400 cycles. The films were amorphous up to a deposition temperature of 300 deg. C, however, deposition on to substrates with textured surfaces facilitated the formation ofcrystalline films. We demonstrate that both the vanadium oxide material and the PECVD deposition method are very attractive for constructing thin-film rechargeable lithium batteries with high capacity and long-term cyclic stability.
| Original language | American English |
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| Pages | 379-384 |
| Number of pages | 6 |
| State | Published - 1998 |
| Event | Materials for Electrochemical Energy Storage and Conversion II Batteries, Capacitors and Fuel Cells: Materials Research Society Symposium - Boston, Massachusetts Duration: 1 Dec 1997 → 5 Dec 1997 |
Conference
| Conference | Materials for Electrochemical Energy Storage and Conversion II Batteries, Capacitors and Fuel Cells: Materials Research Society Symposium |
|---|---|
| City | Boston, Massachusetts |
| Period | 1/12/97 → 5/12/97 |
NREL Publication Number
- NREL/CP-590-25571