High Quality a-Si:H Films Grown at High Deposition Rates

High Quality a-Si:H Films Grown at High Deposition Rates

Research output: Contribution to conference › Paper

Original language	American English
Pages	139-144
Number of pages	6
State	Published - 1999
Event	Materials Research Society Symposium - San Francisco, California Duration: 5 Apr 1999 → 9 Apr 1999

Conference

Conference	Materials Research Society Symposium
City	San Francisco, California
Period	5/04/99 → 9/04/99

Bibliographical note

Work performed by Department of Physics, University of Oregon, Eugene, Oregon, Electrotechnical Laboratory, Tsukuba-shi, Ibaraki 305, Japan, and Solarex, Toano, Virginia

NREL Publication Number

NREL/CP-520-28445

Cite this

@conference{a2ae8941d4744d31b60b44a194fc6fe9,

title = "High Quality a-Si:H Films Grown at High Deposition Rates",

author = "NREL",

note = "Work performed by Department of Physics, University of Oregon, Eugene, Oregon, Electrotechnical Laboratory, Tsukuba-shi, Ibaraki 305, Japan, and Solarex, Toano, Virginia; Materials Research Society Symposium ; Conference date: 05-04-1999 Through 09-04-1999",

year = "1999",

language = "American English",

pages = "139--144",

}

TY - CONF

T1 - High Quality a-Si:H Films Grown at High Deposition Rates

AU - NREL, null

N1 - Work performed by Department of Physics, University of Oregon, Eugene, Oregon, Electrotechnical Laboratory, Tsukuba-shi, Ibaraki 305, Japan, and Solarex, Toano, Virginia

PY - 1999

Y1 - 1999

M3 - Paper

SP - 139

EP - 144

T2 - Materials Research Society Symposium

Y2 - 5 April 1999 through 9 April 1999

ER -