| Original language | American English |
|---|---|
| Patent number | 5,198,263 |
| State | Published - 1993 |
NREL Publication Number
- ACNR/PT-411-13736
High Rate Chemical Vapor Deposition of Carbon Films Using Fluorinated Gases
NREL (Inventor)
Research output: Patent
NREL (Inventor)
Research output: Patent
| Original language | American English |
|---|---|
| Patent number | 5,198,263 |
| State | Published - 1993 |