High Rate Hot-Wire Chemical Vapor Deposition of Silicon Thin Films Using a Stable TaC Covered Graphite Filament

Charles Teplin, Ina Martin, James Portugal, John Mariner

    Research output: Contribution to conferencePaper

    Original languageAmerican English
    Pages4585-4588
    Number of pages4
    DOIs
    StatePublished - 2011
    EventSixth International Conference on Hot-Wire CVD (Cat-CVD) Process - Paris, France
    Duration: 13 Sep 201017 Sep 2010

    Conference

    ConferenceSixth International Conference on Hot-Wire CVD (Cat-CVD) Process
    CityParis, France
    Period13/09/1017/09/10

    NREL Publication Number

    • NREL/CP-520-47930

    Keywords

    • hot-wire chemical vapor deposition (HWCVD)
    • silicon thin films

    Fingerprint

    Dive into the research topics of 'High Rate Hot-Wire Chemical Vapor Deposition of Silicon Thin Films Using a Stable TaC Covered Graphite Filament'. Together they form a unique fingerprint.

    Cite this