High Rate Photochemical Deposition of Amorphous Silicon from Higher Silanes

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	833-836
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	77 & 78
Issue number	Part II
DOIs	https://doi.org/10.1016/0022-3093(85)90789-6
State	Published - 1985

Work performed by Chronar Corporation, Princeton, New Jersey

NREL Publication Number

@article{63e2029f2ea548088ab09dadc2a1ff24,

title = "High Rate Photochemical Deposition of Amorphous Silicon from Higher Silanes",

author = "NREL",

note = "Work performed by Chronar Corporation, Princeton, New Jersey",

year = "1985",

doi = "10.1016/0022-3093(85)90789-6",

language = "American English",

volume = "77 & 78",

pages = "833--836",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier B.V.",

number = "Part II",

}

TY - JOUR

T1 - High Rate Photochemical Deposition of Amorphous Silicon from Higher Silanes

AU - NREL, null

N1 - Work performed by Chronar Corporation, Princeton, New Jersey

PY - 1985

Y1 - 1985

U2 - 10.1016/0022-3093(85)90789-6

DO - 10.1016/0022-3093(85)90789-6

M3 - Article

SN - 0022-3093

VL - 77 & 78

SP - 833

EP - 836

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - Part II

ER -