Abstract
Currently, there is a lack of nonvolatile memory (NVM) technology that can operate continuously at temperatures >200 °C. While ferroelectric NVM has previously demonstrated long polarization retention and >1013 read/write cycles at room temperature, the largest hurdle comes at higher temperatures for conventional perovskite ferroelectrics. Here, we demonstrate how AlScN can enable high-temperature (>200 °C) nonvolatile memory. The c-axis textured thin films were prepared via reactive radiofrequency magnetron sputtering onto a highly textured Pt (111) surface. Photolithographically defined Pt top electrodes completed the capacitor stack, which was tested in a high temperature vacuum probe station up to 400 °C. Polarization–electric field hysteresis loops between 23 and 400 °C reveal minimal changes in the remanent polarization values, while the coercive field decreased from 4.3 MV/cm to 2.6 MV/cm. Even at 400 °C, the polarization retention exhibited negligible loss for up to 1000 s, demonstrating promise for potential nonvolatile memory capable of high−temperature operation. Fatigue behavior also showed a moderate dependence on operating temperature, but the mechanisms of degradation require additional study.
Original language | American English |
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Article number | 887 |
Number of pages | 9 |
Journal | Micromachines |
Volume | 13 |
Issue number | 6 |
DOIs | |
State | Published - 2022 |
Bibliographical note
Publisher Copyright:© 2022 by the authors. Licensee MDPI, Basel, Switzerland.
NREL Publication Number
- NREL/JA-5K00-83088
Keywords
- AlScN
- fatigue
- ferroelectric
- film
- high temperature
- nonvolatile memory
- retention
- sputter deposition
- wurtzite