High-Throughput Chemical Vapor Deposition System and Thin-Film Silicon Library

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	326-329
Number of pages	4
Journal	Macromolecular Rapid Communications
Volume	25
Issue number	1
DOIs	https://doi.org/10.1002/marc.200300151
State	Published - 2004

NLR Publication Number

@article{f0604ef1399f4c42a77c04e29c372e4e,

title = "High-Throughput Chemical Vapor Deposition System and Thin-Film Silicon Library",

author = "NREL",

year = "2004",

doi = "10.1002/marc.200300151",

language = "American English",

volume = "25",

pages = "326--329",

journal = "Macromolecular Rapid Communications",

issn = "1022-1336",

publisher = "Wiley-VCH Verlag",

number = "1",

}