High-Transparency Sputtered In2O3 and ITO Films Containing Zirconium (Presentation)

Timothy Gessert

Research output: NRELPresentation


Our recent investigations have identified a method to produce ITO-like films that are less sensitive to variations in the oxygen-containing deposition ambient. Specifically, we are studying the effect of adding small amounts of Zr to both In2O3 and ITO ceramic sputtering targets.
Original languageAmerican English
Number of pages25
StatePublished - 2007

Publication series

NamePrepared for the AVS 54th International Symposium & Exhibition, 14-17 October 2007, Seattle, Washington.

NREL Publication Number

  • NREL/PR-520-42307


  • large-area
  • optimum electrical properties
  • oxygen-containing deposition
  • PV
  • sputter
  • thin films
  • tin-doped In2O3 (ITO)
  • zirconium


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